Title :
Multilayer conformal coating of highly dense Multi-Walled Carbon Nanotubes bundles
Author :
Fiorentino, Giuseppe ; Vollebregt, Sten ; Ishihara, Ryoichi ; Sarro, Pasqualina M.
Author_Institution :
Fac. of Electr. Eng., Math. & Comput. Sci., Delft Univ. of Technol., Delft, Netherlands
Abstract :
Atomic layer deposition (ALD) is used to deposit ultra-thin and conformal films on flat substrates, porous structures, micro/nano particles and high aspect ratios structures. In this paper we demonstrate the multilayer conformal coating of highly dense Multi-walled Carbon Nanotubes (MWCNTs) bundles grown as islands onto an insulating layer. The multilayered coating consists of alternating layers of dielectric (Aluminium Oxide) and conductive (Titanium Nitride) materials. The coated carbon nanotubes bundles can work as fully integrated nanoelectronic devices and sensors.
Keywords :
atomic layer deposition; carbon nanotubes; conformal coatings; dielectric materials; multilayers; nanofabrication; nanoparticles; nanoporous materials; thin films; ALD; Al2O3; C; TiN; aspect ratio; atomic layer deposition; conductive materials; conformal films; dense multiwalled carbon nanotubes bundles; dielectric materials; flat substrates; insulating layer; integrated nanoelectronic devices; integrated nanoelectronic sensors; microparticles; multilayer conformal coating; nanoparticles; porous structures; Aluminum; Atomic layer deposition; Dielectrics; Geometry; Nanoscale devices; Photonic band gap; Tin;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
Conference_Location :
Birmingham
Print_ISBN :
978-1-4673-2198-3
DOI :
10.1109/NANO.2012.6322054
