• DocumentCode
    1600376
  • Title

    An expirimental system for the measurement of vacuum UV below 115 nm from pulsed plasma in an N2/O2 environment

  • Author

    Ryberg, D. ; Laity, G. ; Fierro, A. ; Dickens, J. ; Neuber, A.

  • Author_Institution
    Depts. of Electr. Eng. & Phys., Texas Tech Univ., Lubbock, TX, USA
  • fYear
    2013
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Limited experimental literature exists for measuring radiation with wavelengths shorter than 115 nm primarily due to the difficulty associated with measuring VUV radiation due to the high absorption in molecular oxygen and optical materials. Furthermore, there is an increasing interest in quantifying the role of this radiation in the generation of low temperature plasmas. This paper describes a system for studying the early mechanisms of vacuum UV generation below 115 nm by inducing breakdown in an air environment near atmospheric pressure. However to avoid the attenuating effects of O2, the experiment is set up such that the pressure drops to deep vacuum (i.e. ~10-6 torr) within a distance of several millimeters from the location of breakdown without the use of a solid barrier. In order to perform this measurement, the experiment consists of an enclosure at high vacuum, a pair of electrodes, and a micro puff valve. The puff value releases an above atmospheric pressure wave of air in the vicinity of the electrodes, whose differential electrical potential is then raised to about 20kV with a rise-time on the order of 100 nanoseconds. With application of the pulsed electric field, the radiation emitted from the excited species escapes the very localized puff of air and propagates through the high vacuum largely unattenuated where it is resolved by vacuum UV-sensitive optics and detectors. With this setup, the generation of vacuum UV radiation below 115 nm can be studied in detail and in the future the data recorded with this system will be used in our modeling approaches for further understanding of low temperature plasma generation.
  • Keywords
    nitrogen; oxygen; plasma diagnostics; plasma production; ultraviolet spectra; vacuum breakdown; N2; N2/O2 environment; O2; VUV radiation; air environment; atmospheric pressure; attenuating effect; breakdown induction; deep vacuum; differential electrical potential; excited species; experimental system; low temperature plasma generation; micropuff valve; molecular oxygen; optical material; pressure 1 atm; pressure drops; pulsed electric field; pulsed plasma; radiation emission; rise-time; solid barrier; time 100 ns; vacuum UV generation; vacuum UV radiation; vacuum UV-sensitive optics; voltage 20 kV; wavelength 115 nm; Optical variables measurement; Plasma measurements; Plasmas; Power measurement; Pulse measurements; Vacuum systems;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2013.6635150
  • Filename
    6635150