Title :
3D nanofabrication of components by repeated corner lithography: Self aligned sub-50nm apertures
Author :
Burouni, Narges ; Berenschot, Erwin ; Elwenspoek, Miko ; Tas, Niels R.
Author_Institution :
Transducers Sci. & Technol. Group, Univ. of Twente, Enschede, Netherlands
Abstract :
Repeated corner lithography is an innovative method in wafer scale to obtain three dimensional nano structures, which are uniform and compatible with geometrical expectation. In this paper we present novel sub-50nm apertures fabricated by repeated corner lithography. An important result from the presented work is that it is possible to control the aperture size and feature by initial layer thickness of nitride and proper choice of LOCOS temperature and oxidation time.
Keywords :
lithography; nanofabrication; 3D nanofabrication; LOCOS temperature; geometrical expectation; innovative method; oxidation time; repeated corner lithography; size 50 nm; three dimensional nano structures; Apertures; Force;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
Conference_Location :
Birmingham
Print_ISBN :
978-1-4673-2198-3
DOI :
10.1109/NANO.2012.6322189
