Title : 
Calibration measurements down to 50nm with photon correlation nano LDA
         
        
            Author : 
Vamos, Lenard ; Jani, P. ; Nagy, Attila ; Szigethy, Dezso
         
        
            Author_Institution : 
WIGNER RCP, SZFKI, Budapest, Hungary
         
        
        
        
        
            Abstract : 
Photon correlation LDA was developed for process monitoring of nanoparticle fabrication. The system measures particle number, velocity and size of submicron particles simultaneously. The backscattering arrangement assures the online, in-situ, non-invasive measurements without further fine tuning. Compared to single particle counters the system works with much higher resolution in particle sizing and velocity measurements. High resolution measurements can be performed also in space and time to provide new insights in fundamental processes such as nanoparticle growth and motion. It was shown with monodisperse for silicon oxide particles in calibration measurements, that the lower detection limit is around 50nm and the size resolution is below 10nm.
         
        
            Keywords : 
calibration; laser Doppler anemometry; nanofabrication; nanoparticles; particle size measurement; silicon compounds; velocity measurement; SiO2; backscattering arrangement; calibration measurements; detection limit; high resolution measurements; nanoparticle fabrication; nanoparticle growth; online insitu noninvasive measurements; particle number; particle sizing; photon correlation nanoLDA; silicon oxide particles; size resolution; submicron particles; velocity measurements; Atmospheric measurements; Calibration; Ionization; Particle measurements; System-on-a-chip;
         
        
        
        
            Conference_Titel : 
Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
         
        
            Conference_Location : 
Birmingham
         
        
        
            Print_ISBN : 
978-1-4673-2198-3
         
        
        
            DOI : 
10.1109/NANO.2012.6322213