• DocumentCode
    1605193
  • Title

    Computational analysis and performance evaluation of representative wafer scale integration interconnections

  • Author

    Lyke, James C., Jr. ; Kolesar, Edward S., Jr.

  • Author_Institution
    Air Force Inst. of Technol., Wright-Patterson AFB, Dayton, OH, USA
  • fYear
    1992
  • Firstpage
    255
  • Lastpage
    258
  • Abstract
    The electrical performance of wafer-scale integration interconnections was studied, with an emphasis on the characteristic impedance. The study was based on closed-form expressions, finite difference method models, commercially available microwave circuit analysis software, and a numerical evaluation of the Telegrapher equations. Measurements were conducted on 5-in-diameter test wafers which contained numerous interconnection structures. The results revealed interesting information concerning the driving-point impedances of the structures, the inadequacy of closed-form models for accurate estimation, and the need for more accurate modeling techniques.<>
  • Keywords
    VLSI; automatic testing; circuit analysis computing; electric impedance measurement; finite difference methods; integrated circuit testing; microstrip lines; multichip modules; transmission line theory; 5 inch; Telegrapher equations; characteristic impedance; closed-form expressions; computational analysis; driving-point impedances; electrical performance; finite difference method models; microstrip; microwave circuit analysis software; modeling; numerical evaluation; performance evaluation; stripline; wafer scale integration interconnections; Circuit analysis; Closed-form solution; Difference equations; Finite difference methods; Impedance; Integrated circuit interconnections; Microwave theory and techniques; Performance analysis; Semiconductor device modeling; Wafer scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    AUTOTESTCON '92. IEEE Systems Readiness Technology Conference, Conference Record
  • Conference_Location
    Dayton, OH, USA
  • Print_ISBN
    0-7803-0643-0
  • Type

    conf

  • DOI
    10.1109/AUTEST.1992.270106
  • Filename
    270106