Characterization of a new transformer coupled plasma source by fast-scanning electric probes

Summary form only given, as follows. A fast-scanning system with single and triple electric probes is developed to characterize a new transformer coupled plasma (TCP) source, where magnetic field trapping is applied, as a commercial etching device. Radial variation of plasma density and electron temperature are measured and dependence of these parameters on the RF power and gas pressure are analyzed along with the optimal operating conditions. Comparisons are made between data by a triple probe and those by a single probe. Non-thermal properties of TCP will be discussed.