• DocumentCode
    1606653
  • Title

    TMR Design Methodology for SPin-Transfer Torque RAM (SPRAM) with Nonvolatile and SRAM Compatible Operations

  • Author

    Takemura, R. ; Kawahara, T. ; Hayakawa, J. ; Miura, K. ; Ito, K. ; Yamanouchi, M. ; Ikeda, S. ; Takahashi, H. ; Matsuoka, H. ; Ohno, H.

  • Author_Institution
    Central Res. Lab., Hitachi Ltd., Tokyo
  • fYear
    2008
  • Firstpage
    54
  • Lastpage
    56
  • Abstract
    We propose a tunnel magneto resistance (TMR) design methodology for SPRAM that takes into account the disturbances during read operations and the data retention periods. We have clarified that the thermal stability factor (E/kBT) of TMR must be higher than 64 to ensure a 10-year data retention and a continual non-destructive read-operation. Moreover, the thick synthetic ferromagnetic free layer with Fe-rich CoFeB can achieve a E/kBT of 64 while maintaining a low write cell current of less than 400 muA/cell with a 100 times 160 nm2 TMR.
  • Keywords
    SRAM chips; SRAM compatible operation; data retention period; random access memory; static RAM; thermal stability factor; tunnel magneto resistance; Design methodology; Indium tin oxide; Laboratories; Nanoelectronics; Nonvolatile memory; Random access memory; Read-write memory; Thermal factors; Thermal stability; Torque;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Semiconductor Memory Workshop, 2008 and 2008 International Conference on Memory Technology and Design. NVSMW/ICMTD 2008. Joint
  • Conference_Location
    Opio
  • Print_ISBN
    978-1-4244-1546-5
  • Electronic_ISBN
    978-1-4244-1547-2
  • Type

    conf

  • DOI
    10.1109/NVSMW.2008.22
  • Filename
    4531822