DocumentCode
1606653
Title
TMR Design Methodology for SPin-Transfer Torque RAM (SPRAM) with Nonvolatile and SRAM Compatible Operations
Author
Takemura, R. ; Kawahara, T. ; Hayakawa, J. ; Miura, K. ; Ito, K. ; Yamanouchi, M. ; Ikeda, S. ; Takahashi, H. ; Matsuoka, H. ; Ohno, H.
Author_Institution
Central Res. Lab., Hitachi Ltd., Tokyo
fYear
2008
Firstpage
54
Lastpage
56
Abstract
We propose a tunnel magneto resistance (TMR) design methodology for SPRAM that takes into account the disturbances during read operations and the data retention periods. We have clarified that the thermal stability factor (E/kBT) of TMR must be higher than 64 to ensure a 10-year data retention and a continual non-destructive read-operation. Moreover, the thick synthetic ferromagnetic free layer with Fe-rich CoFeB can achieve a E/kBT of 64 while maintaining a low write cell current of less than 400 muA/cell with a 100 times 160 nm2 TMR.
Keywords
SRAM chips; SRAM compatible operation; data retention period; random access memory; static RAM; thermal stability factor; tunnel magneto resistance; Design methodology; Indium tin oxide; Laboratories; Nanoelectronics; Nonvolatile memory; Random access memory; Read-write memory; Thermal factors; Thermal stability; Torque;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Semiconductor Memory Workshop, 2008 and 2008 International Conference on Memory Technology and Design. NVSMW/ICMTD 2008. Joint
Conference_Location
Opio
Print_ISBN
978-1-4244-1546-5
Electronic_ISBN
978-1-4244-1547-2
Type
conf
DOI
10.1109/NVSMW.2008.22
Filename
4531822
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