Low-noise automated measurement system for low-frequency current fluctuations in thin-oxide silicon structures

Author

Saletti, R. ; Neri, B.

Author_Institution

Centro di Studio per Metodi e Dispositivi per Radiotrasmissioni, Consiglio Nazionale delle Ricerche, Pisa, Italy

fYear

1991

Firstpage

585

Lastpage

589

Abstract

A description is given of the design of an automated system for low-noise measurement of low-frequency current fluctuations in thin-oxide silicon devices. The aim of these measurements is to study the current tunneling through the oxide, and to investigate its correlation with the oxide breakdown. The dedicated system is realized by integrating a personal computer commercial acquisition board with custom high-sensibility low-noise preamplifiers

Keywords

computerised instrumentation; electric breakdown of solids; electric current measurement; electric noise measurement; insulating thin films; microcomputer applications; silicon compounds; tunnelling; 10 nm; SiO₂; automated measurement; commercial acquisition board; correlation; current tunneling; dedicated system; low-frequency current fluctuations; low-noise measurement; low-noise preamplifiers; oxide breakdown; personal computer; Breakdown voltage; Current measurement; Dielectric breakdown; Electric breakdown; Fluctuations; Microcomputers; Silicon devices; Stress; Telecommunications; Tunneling;

fLanguage

English

Publisher

ieee

Conference_Titel

Instrumentation and Measurement Technology Conference, 1991. IMTC-91. Conference Record., 8th IEEE

Conference_Location

Atlanta, GA

Print_ISBN

0-87942-579-2

Type

conf

DOI

10.1109/IMTC.1991.161662

Filename

161662