DocumentCode
1607109
Title
Anomalous Erase Behavior in Charge Trapping Memory Cells
Author
Beug, M.F. ; Melde, T. ; Isler, M. ; Bach, L. ; Ackermann, M. ; Riedel, S. ; Knobloch, K. ; Lud, C.
Author_Institution
Qimonda Dresden GmbH & Co. OHG, Dresden
fYear
2008
Firstpage
121
Lastpage
123
Abstract
This article details an anomalous erase behavior in charge trapping memory devices which is visible in a characteristic erase hump in transient erase curves. For an initial period of time a Vt increase is seen when erase condition are applied to virgin cells before the expected erasing takes place for longer erase pulse duration. This is attributed to charges injected from the gate corners to the areas above source and drain. This effect significantly deteriorates the erase performance of charge trapping devices compared to the intrinsic erase behavior which can be measured at large area capacitor structures.
Keywords
flash memories; anomalous erase behavior; charge trapping memory cells; flash memory; transient erase curves; Aluminum oxide; Area measurement; Capacitors; Character generation; Charge measurement; Current measurement; Flash memory; Plugs; Silicon compounds; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Semiconductor Memory Workshop, 2008 and 2008 International Conference on Memory Technology and Design. NVSMW/ICMTD 2008. Joint
Conference_Location
Opio
Print_ISBN
978-1-4244-1546-5
Electronic_ISBN
978-1-4244-1547-2
Type
conf
DOI
10.1109/NVSMW.2008.42
Filename
4531842
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