DocumentCode :
1607109
Title :
Anomalous Erase Behavior in Charge Trapping Memory Cells
Author :
Beug, M.F. ; Melde, T. ; Isler, M. ; Bach, L. ; Ackermann, M. ; Riedel, S. ; Knobloch, K. ; Lud, C.
Author_Institution :
Qimonda Dresden GmbH & Co. OHG, Dresden
fYear :
2008
Firstpage :
121
Lastpage :
123
Abstract :
This article details an anomalous erase behavior in charge trapping memory devices which is visible in a characteristic erase hump in transient erase curves. For an initial period of time a Vt increase is seen when erase condition are applied to virgin cells before the expected erasing takes place for longer erase pulse duration. This is attributed to charges injected from the gate corners to the areas above source and drain. This effect significantly deteriorates the erase performance of charge trapping devices compared to the intrinsic erase behavior which can be measured at large area capacitor structures.
Keywords :
flash memories; anomalous erase behavior; charge trapping memory cells; flash memory; transient erase curves; Aluminum oxide; Area measurement; Capacitors; Character generation; Charge measurement; Current measurement; Flash memory; Plugs; Silicon compounds; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Semiconductor Memory Workshop, 2008 and 2008 International Conference on Memory Technology and Design. NVSMW/ICMTD 2008. Joint
Conference_Location :
Opio
Print_ISBN :
978-1-4244-1546-5
Electronic_ISBN :
978-1-4244-1547-2
Type :
conf
DOI :
10.1109/NVSMW.2008.42
Filename :
4531842
Link To Document :
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