• DocumentCode
    1607109
  • Title

    Anomalous Erase Behavior in Charge Trapping Memory Cells

  • Author

    Beug, M.F. ; Melde, T. ; Isler, M. ; Bach, L. ; Ackermann, M. ; Riedel, S. ; Knobloch, K. ; Lud, C.

  • Author_Institution
    Qimonda Dresden GmbH & Co. OHG, Dresden
  • fYear
    2008
  • Firstpage
    121
  • Lastpage
    123
  • Abstract
    This article details an anomalous erase behavior in charge trapping memory devices which is visible in a characteristic erase hump in transient erase curves. For an initial period of time a Vt increase is seen when erase condition are applied to virgin cells before the expected erasing takes place for longer erase pulse duration. This is attributed to charges injected from the gate corners to the areas above source and drain. This effect significantly deteriorates the erase performance of charge trapping devices compared to the intrinsic erase behavior which can be measured at large area capacitor structures.
  • Keywords
    flash memories; anomalous erase behavior; charge trapping memory cells; flash memory; transient erase curves; Aluminum oxide; Area measurement; Capacitors; Character generation; Charge measurement; Current measurement; Flash memory; Plugs; Silicon compounds; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Semiconductor Memory Workshop, 2008 and 2008 International Conference on Memory Technology and Design. NVSMW/ICMTD 2008. Joint
  • Conference_Location
    Opio
  • Print_ISBN
    978-1-4244-1546-5
  • Electronic_ISBN
    978-1-4244-1547-2
  • Type

    conf

  • DOI
    10.1109/NVSMW.2008.42
  • Filename
    4531842