DocumentCode :
1608162
Title :
Behavior of temperature inside PN junction during microplasma switching
Author :
Raska, M. ; Andreev, A. ; Holcman, V. ; Koktavy, P.
Author_Institution :
Dept. of Phys., BUT, Brno, Czech Republic
fYear :
2008
Firstpage :
51
Lastpage :
54
Abstract :
The contribution is focused on determination of a temperature inside PN junction defect regions. These defect regions are called microplasmas. The microplasma is specified like region with a lower strong-field avalanche ionization breakdown voltage than other homogenous PN junction regions. The existence of such regions may lead to local avalanche breakdowns occurring in reverse-biased PN junction at certain voltage. These local avalanche breakdowns may exhibit like a current impulse noise. These impulses are usually represented by constant amplitude, random pulse width and random pulse origin time points. During the measurement of the microplasma noise was observed a relation between two-states current impulse noise and a temperature of a PN junction defect region. The main goal of this article is a determination of temperature behavior inside the microplasma region depends on a current impulse noise time behavior.
Keywords :
avalanche breakdown; p-n junctions; semiconductor device breakdown; semiconductor diodes; temperature measurement; PN junction defect; current impulse noise time; microplasma switching; reverse-biased PN junction; strong-field avalanche ionization breakdown voltage; temperature determination; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Technology, 2008. ISSE '08. 31st International Spring Seminar on
Conference_Location :
Budapest
Print_ISBN :
978-1-4244-3972-0
Electronic_ISBN :
978-1-4244-3974-4
Type :
conf
DOI :
10.1109/ISSE.2008.5276469
Filename :
5276469
Link To Document :
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