Micromachined solenoids for highly sensitive magnetic sensors

Micromachined solenoids on silicon wafer for highly sensitive vector magnetic field sensors have been proposed. The feature of the solenoids is that the magnetic field is parallel to the wafer surface. In order to realize interconnections on three-dimensional structure, direct electron beam lithography was utilized. The formation of Mo interconnections was achieved on the surface of deep U-shaped grooves. Applications of the solenoids are also discussed.<>