DocumentCode :
1608741
Title :
Influence of interface states on C-V characteristics of AlGaN/GaN heterostructures
Author :
Osvald, J.
Author_Institution :
Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava, Slovakia
fYear :
2010
Firstpage :
167
Lastpage :
170
Abstract :
We tried to assess the influence of interface states between AlGaN barrier and GaN buffer layer and interface states on C-V characteristics of the AlGaN/GaN structure. Interface donor states were modelled with discrete peak distribution in energy with certain energy with respect to the conduction band minimum and also by continuous distribution of interface traps in energy. We found that interface states shift C-V curves to more negative voltages and change the plateau of C-V curves as well as do deep levels situated in AlGaN layer and the deep levels in GaN change the slope of capacitance decrease after the two-dimensional electron gas depletion.
Keywords :
electron gas; gallium compounds; high electron mobility transistors; silver compounds; AlGaN-GaN; C-V characteristics; buffer layer; discrete peak distribution; interface states; interface traps; two-dimensional electron gas depletion; Aluminum gallium nitride; Capacitance; Capacitance-voltage characteristics; Frequency measurement; Gallium nitride; Interface states; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices & Microsystems (ASDAM), 2010 8th International Conference on
Conference_Location :
Smolenice
Print_ISBN :
978-1-4244-8574-1
Type :
conf
DOI :
10.1109/ASDAM.2010.5666330
Filename :
5666330
Link To Document :
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