Title : 
A 243-GHz Ft and 208-GHz Fmax, 90-nm SOI CMOS SoC technology with low-power millimeter-wave digital and RF circuit capability
         
        
            Author : 
Zamdmer, Noah ; Kim, Jonghae ; Trzcinski, Robert ; Plouchart, Jean-Olivier ; Narasimha, Shreesh ; Khare, Mukesh ; Wagner, Lawrence ; Chaloux, Susan
         
        
            Author_Institution : 
Dev. Center, IBM Semicond. Res., Hopewell Junction, NY, USA
         
        
        
        
        
            Abstract : 
SOI CMOS technology offers low parasitic junction capacitance, and therefore provides speed and power enhancements to digital applications compared to bulk CMOS. It is also emerging as a good candidate for high-performance SoC, with integratable RF circuits that operate beyond 30-GHz already demonstrated at the 130-nm technology node. The digital aspects of the base 90-nm SOI technology were previously reported. This paper presents the RF performance of this technology, and shows that the capabilities of CMOS technology are expanding into the millimeter-wave regime.
         
        
            Keywords : 
CMOS integrated circuits; millimetre wave integrated circuits; silicon-on-insulator; system-on-chip; 130 nm; 208 GHz; 243 GHz; 90 nm; RF circuit capability; SOI CMOS SoC technology; low-power millimeter-wave digital circuit; CMOS digital integrated circuits; CMOS technology; Integrated circuit technology; Millimeter wave circuits; Millimeter wave measurements; Millimeter wave technology; Parasitic capacitance; Performance evaluation; Radio frequency; Varactors;
         
        
        
        
            Conference_Titel : 
VLSI Technology, 2004. Digest of Technical Papers. 2004 Symposium on
         
        
            Print_ISBN : 
0-7803-8289-7
         
        
        
            DOI : 
10.1109/VLSIT.2004.1345415