DocumentCode
1609161
Title
Inter-digitated AlGaN/GaN Schottky diode for monolithic integration
Author
Paszkiewicz, B. ; Paszkiewicz, R. ; Wosko, M. ; Tlaczala, M.
Author_Institution
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
fYear
2010
Firstpage
57
Lastpage
60
Abstract
New construction of the AlGaN/GaN/semi-insulating Schottky diode was proposed for operation at gigahertz regime. Based on the performed numerical simulations the planar diode with inter-digitated lay out was elaborated. The test structures of the diode was fabricated in AlGaN/GaN heterostructures grown on a c-plane sapphire by MOVPE technique. The d.c. and high frequency characteristics of the device were measured. The cut-off frequency, fT, of the diode was 8.2 GHz. The obtained results proved that inter-digitated Schottky diode fabricated in AlGaN/GaN heterostructure grown on semi-insulating substrate is suitable for high frequency operation at gigahertz regime and could be also monolithically integrated with HEMT.
Keywords
MMIC; MOCVD; Schottky diodes; aluminium compounds; gallium compounds; AlGaN-GaN; HEMT; MOVPE technique; frequency 8.2 GHz; interdigitated Schottky diode; monolithic integration; numerical simulations; planar diode; semiinsulating Schottky diode; semiinsulating substrate; Aluminum gallium nitride; Current measurement; Frequency measurement; Gallium nitride; HEMTs; Schottky barriers; Schottky diodes;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Devices & Microsystems (ASDAM), 2010 8th International Conference on
Conference_Location
Smolenice
Print_ISBN
978-1-4244-8574-1
Type
conf
DOI
10.1109/ASDAM.2010.5666350
Filename
5666350
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