Title :
Compact model extraction from quantum corrected statistical Monte Carlo simulation of random dopant induced drain current variability
Author :
Kovac, Urban ; Alexander, Craig ; Roy, Gareth ; Cheng, Binjie ; Asenov, A.
Author_Institution :
Dept. Electron. & Electr. Eng., Univ. of Glasgow, Glasgow, UK
Abstract :
An efficient method to accurately capture quantum confinement effects within Monte Carlo (MC) simulation while simultaneously resolving `ab initio´ ionized impurity scattering via the density gradient (DG) formalism is presented. The model is applied to study the impact of transport variability due to scattering from random discrete dopants on the on-current variability in realistic nano CMOS transistors. Such simulations result in an increase in drain current variability when compared with similarly quantum corrected drift diffusion (DD) simulation. Following this, an efficient three-stage hierarchical strategy is presented that propagates the increased on-current variability captured in 3D quantum corrected `ab initio´ MC into efficient 3D DD simulations that are in turn used to obtain target ID-VG characteristics for the extraction of statistical compact models.
Keywords :
MOSFET; Monte Carlo methods; carrier mobility; impurity scattering; nanostructured materials; semiconductor device models; semiconductor doping; 3D quantum corrected MC simulation; compact model extraction; density gradient formalism; drain current variability; ionized impurity scattering; nano CMOS transistor; on-current variability; quantum confinement effect; quantum corrected statistical Monte Carlo simulation; random discrete dopant; random dopant induced drain current variability; transport variability; Calibration; Electric potential; Electron devices; Integrated circuit modeling; Semiconductor process modeling; Solid modeling; Three dimensional displays;
Conference_Titel :
Advanced Semiconductor Devices & Microsystems (ASDAM), 2010 8th International Conference on
Conference_Location :
Smolenice
Print_ISBN :
978-1-4244-8574-1
DOI :
10.1109/ASDAM.2010.5666361