Title :
Numerical optimization of SiNx antireflection coatings for crystalline silicon on glass solar cells
Author :
Beye, M. ; Faye, M.E. ; Ndiaye, A. ; Maiga, A.S.
Author_Institution :
Dept. of Appl. Phys., Univ. Gaston Berger, St. Louis, Senegal
Abstract :
The transfer matrix method is used to calculate the reflectance of a crystalline silicon on glass solar cell with a silicon nitride layer (SiNx) as antireflection coating (ARC). It is found that a SiNx double-layer ARC has little advantage over the single layer one. Among all SiNx double layer structures, the refractive index (and thickness) combination of 2.1 (35 nm) and 2.3 (40 nm) for the top and the bottom layer, respectively, is found to provide the highest short circuit current density (Jsc). The influence of the angle of incidence on the reflectance is also studied. The numerical optimization procedure and its results are presented.
Keywords :
antireflection coatings; current density; elemental semiconductors; glass; matrix algebra; numerical analysis; optimisation; silicon; silicon compounds; solar cells; ARC; Si; SiNx; antireflection coating; crystalline silicon glass solar cell; double layer structure; numerical optimization procedure; reflectance calculation; refractive index; short circuit current density; size 35 nm; size 40 nm; transfer matrix method; Coatings; Glass; Optimization; Photovoltaic cells; Reflectivity; Refractive index; Silicon; Silicon nitride; antireflection coating; double layer; single layer;
Conference_Titel :
Clean Energy and Technology (CEAT), 2013 IEEE Conference on
Conference_Location :
Lankgkawi
Print_ISBN :
978-1-4799-3237-5
DOI :
10.1109/CEAT.2013.6775658
