Title :
Effective Apodized Phase Mask for Optimum FBGs
Author :
Pan, J.J. ; Zhou, F.Q. ; Shi, Y. ; Li, S.X.
Author_Institution :
E-TEK Dynamics, Inc.
Keywords :
Bandwidth; Etching; Reflectivity; Silicon compounds;
Conference_Titel :
Lasers and Electro-Optics Europe, 1998. 1998 CLEO/Europe. Conference on
Conference_Location :
Glasgow, Scotland
Print_ISBN :
0-7803-4233X
DOI :
10.1109/CLEOE.1998.719558
