Title :
Neutral beam technology — Defect-free nanofabrication for novel nanomaterials and nanodevices
Author_Institution :
Inst. of Fluid Sci., Tohoku Univ., Sendai, Japan
Abstract :
Ultra-low-damage nanofabrication techniques using neutral beam technology that taps into the essential nature of nanomaterials and nanostructures are actively developing for innovative nanodevices.
Keywords :
nanofabrication; nanostructured materials; defect-free nanofabrication; innovative nanodevices; nanostructures; neutral beam technology; novel nanomaterials; ultralow-damage nanofabrication techniques; Etching; Nanofabrication; Nanoscale devices; Nanostructures; Particle beams; Plasmas; Silicon; Defect Control; Deposition; Etching; Nanodevices); Neutral Bema Technology; Surface Modification;
Conference_Titel :
Next-Generation Electronics (ISNE), 2014 International Symposium on
Conference_Location :
Kwei-Shan
DOI :
10.1109/ISNE.2014.6839390
