DocumentCode
161217
Title
Neutral beam technology — Defect-free nanofabrication for novel nanomaterials and nanodevices
Author
Samukawa, Seiji
Author_Institution
Inst. of Fluid Sci., Tohoku Univ., Sendai, Japan
fYear
2014
fDate
7-10 May 2014
Firstpage
1
Lastpage
2
Abstract
Ultra-low-damage nanofabrication techniques using neutral beam technology that taps into the essential nature of nanomaterials and nanostructures are actively developing for innovative nanodevices.
Keywords
nanofabrication; nanostructured materials; defect-free nanofabrication; innovative nanodevices; nanostructures; neutral beam technology; novel nanomaterials; ultralow-damage nanofabrication techniques; Etching; Nanofabrication; Nanoscale devices; Nanostructures; Particle beams; Plasmas; Silicon; Defect Control; Deposition; Etching; Nanodevices); Neutral Bema Technology; Surface Modification;
fLanguage
English
Publisher
ieee
Conference_Titel
Next-Generation Electronics (ISNE), 2014 International Symposium on
Conference_Location
Kwei-Shan
Type
conf
DOI
10.1109/ISNE.2014.6839390
Filename
6839390
Link To Document