Title :
Removal of SO2 using a wet-type nonthermal plasma reactor
Author :
Kinoshita, Youhei ; Saito, Keita ; Takashima, Kazunori ; Katsura, Shinji ; Mizuno, Akira
Author_Institution :
Dept. of Ecological Eng., Toyohashi Univ. of Technol., Japan
Abstract :
Wet-plasma process for SO/sub 2/ removal has been proposed, and fundamental characteristics have been evaluated. The plasma reactor was a wire-cylinder wet type ESP that was driven by pulsed high voltage. Water film containing ammonium peroxodisulfate ((NH/sub 4/)/sub 2/S/sub 2/O/sub 8/) was maintained on the wall of the reactor. By raising the temperature of the solution up to 80/spl deg/C, ammonium ion (NH/sub 4//sup +/) and hydrogen peroxide (H/sub 2/O/sub 2/) were generated in the solution. The former enhances SO/sub 2/ absorption into the solution and the latter is effective to oxidize S species. The experiment was carried out at 40/spl deg/C and 80/spl deg/C of the solution, and with three initial concentrations of ammonium peroxodisulfate (0%, 5%, 10%). SO/sub 2/ removal rate increased with increasing the initial concentration of ammonium peroxodisulfate. Higher temperature of the solution yielded higher SO/sub 2/ removal rate. SO/sub 2/ removal rate more than 95% was observed at the optimum condition. In this experiment (80/spl deg/C, (NH/sub 4/)/sub 2/S/sub 2/O/sub 8/:10%) with the specific input energy of 22 kJ/Nm/sup 3/ with NH/sub 4//sup +/ ion, SO/sub 2/ absorption was enhanced significantly even the pH value of the liquid became lower than 3.
Keywords :
air pollution control; electrostatic precipitators; plasma chemistry; plasma devices; pulsed power supplies; sulphur compounds; (NH/sub 4/)/sub 2/S/sub 2/O/sub 8/; 40 C; 80 C; H/sub 2/O/sub 2/; NH/sub 4/; NH/sub 4//sup +/; S species oxidation; SO/sub 2/; SO/sub 2/ absorption enhancement; SO/sub 2/ removal; ammonium ion; ammonium peroxodisulfate; hydrogen peroxide; pulsed high voltage; water film; wet-plasma process; wet-type nonthermal plasma reactor; wire-cylinder wet type ESP; Absorption; Cleaning; Electrostatic precipitators; Inductors; Oxidation; Plasma applications; Plasma properties; Plasma temperature; Voltage; Wire;
Conference_Titel :
Industry Applications Conference, 2001. Thirty-Sixth IAS Annual Meeting. Conference Record of the 2001 IEEE
Conference_Location :
Chicago, IL, USA
Print_ISBN :
0-7803-7114-3
DOI :
10.1109/IAS.2001.955495