DocumentCode :
1613259
Title :
Studies on the ammonium salts collection of SO2 removal with dielectric barrier discharge
Author :
Zhang, Zhitao ; Bai, Xiyao ; Bai, Mindong ; Zhou, Xaojian ; Bai, Mindi
Author_Institution :
Dept. of Phys., Northeastern Univ., Shenyang, China
Volume :
1
fYear :
2001
Firstpage :
714
Abstract :
Removal of SO/sub 2/ by thermal chemical method cannot be applied due to low collection efficiency of ammonium salts and unstable products. Using the new technology of dielectric barrier, the activated particles of high-concentration and high-energy are produced by the strong ionization discharge in the plasma reactor, so that SO/sub 2/ is oxidized to produce H/sub 2/SO/sub 4/ and further to form stable solid particles of (NH/sub 4/)/sub 2/SO/sub 4/ after thermal chemical reaction with NH/sub 3/. A large number of the solid particles of ammonium sulfate are collected in an electrostatic precipitator (EP). As a result, the collection efficiency of SO/sub 2/ is up to 88%, the removal efficiency is above 90%, and the energy consumption is less than 9.0 Wh/Nm/sup 3/. Therefore, the SO/sub 2/ removal of high effective dry method is realized. With this method, the one off investment of removal of SO/sub 2/ is decreased greatly, and the expenses for the additive NH/sub 3/ and the electricity are offset by the profits of the collection of ammonium salts.
Keywords :
air pollution control; ammonium compounds; discharges (electric); electrostatic precipitators; ionisation; oxidation; power consumption; sulphur compounds; thermochemistry; (NH/sub 4/)/sub 2/SO/sub 4/; H/sub 2/SO/sub 4/; NH/sub 3/; SO/sub 2/; SO/sub 2/ oxidation; SO/sub 2/ removal; ammonium salts collection; ammonium sulfate; collection efficiency; dielectric barrier; dielectric barrier discharge; electrostatic precipitator; energy consumption; high-concentration; high-energy; low collection efficiency; plasma reactor; removal efficiency; solid particles; stable solid particles; strong ionization discharge; thermal chemical method; thermal chemical reaction; unstable products; Chemical products; Chemical reactors; Chemical technology; Dielectrics; Electrostatic precipitators; Inductors; Ionization; Plasma chemistry; Plasma stability; Solids;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Conference, 2001. Thirty-Sixth IAS Annual Meeting. Conference Record of the 2001 IEEE
Conference_Location :
Chicago, IL, USA
ISSN :
0197-2618
Print_ISBN :
0-7803-7114-3
Type :
conf
DOI :
10.1109/IAS.2001.955499
Filename :
955499
Link To Document :
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