• DocumentCode
    1613422
  • Title

    Relative wavelet energy as a tool to select suitable wavelet for artifact removal in EEG

  • Author

    Salwani, M.D. ; Jasmy, Y.

  • Author_Institution
    Dept. of Electrical Eng., PPD, UTM Citycampus, Kuala Lumpur, Malaysia
  • fYear
    2005
  • Firstpage
    282
  • Lastpage
    287
  • Abstract
    We proposed a novel approach to select a wavelet for artifact removal in electroencephalogram (EEG) by comparing their relative wavelet energies before and after thresholding. Relative wavelet energy (RWE) gives information about the relative energy associated with different frequency bands and can be considered as a time-scale density. RWE can be used as a tool to detect and characterize a specific phenomenon in time and frequency planes. We used Lifting Wavelet Transform to remove the common artifacts exist in EEG i.e. blink and eye movements. Three basic steps involved are to transform the EEG, hard thresholding the wavelet coefficients and the corrected EEG is obtained by inverse transform these threshold coefficients. It is of paramount important to select a suitable wavelet and threshold to accomplish this task. From this study, we concluded that cdf4.4 outperformed db4 and haar wavelets by removing the artifacts at the correct times and frequency bands.
  • Keywords
    Electroencephalography; Electrooculography; Energy resolution; Frequency; Scalp; Signal resolution; Turing machines; Voltage; Wavelet coefficients; Wavelet transforms; EEG; lifting wavelet transform; ocular artifacts; relative wavelet energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computers, Communications, & Signal Processing with Special Track on Biomedical Engineering, 2005. CCSP 2005. 1st International Conference on
  • Conference_Location
    Kuala Lumpur, Malaysia
  • Print_ISBN
    978-1-4244-0011-9
  • Electronic_ISBN
    978-1-4244-0012-6
  • Type

    conf

  • DOI
    10.1109/CCSP.2005.4977207
  • Filename
    4977207