DocumentCode
1613422
Title
Relative wavelet energy as a tool to select suitable wavelet for artifact removal in EEG
Author
Salwani, M.D. ; Jasmy, Y.
Author_Institution
Dept. of Electrical Eng., PPD, UTM Citycampus, Kuala Lumpur, Malaysia
fYear
2005
Firstpage
282
Lastpage
287
Abstract
We proposed a novel approach to select a wavelet for artifact removal in electroencephalogram (EEG) by comparing their relative wavelet energies before and after thresholding. Relative wavelet energy (RWE) gives information about the relative energy associated with different frequency bands and can be considered as a time-scale density. RWE can be used as a tool to detect and characterize a specific phenomenon in time and frequency planes. We used Lifting Wavelet Transform to remove the common artifacts exist in EEG i.e. blink and eye movements. Three basic steps involved are to transform the EEG, hard thresholding the wavelet coefficients and the corrected EEG is obtained by inverse transform these threshold coefficients. It is of paramount important to select a suitable wavelet and threshold to accomplish this task. From this study, we concluded that cdf4.4 outperformed db4 and haar wavelets by removing the artifacts at the correct times and frequency bands.
Keywords
Electroencephalography; Electrooculography; Energy resolution; Frequency; Scalp; Signal resolution; Turing machines; Voltage; Wavelet coefficients; Wavelet transforms; EEG; lifting wavelet transform; ocular artifacts; relative wavelet energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Computers, Communications, & Signal Processing with Special Track on Biomedical Engineering, 2005. CCSP 2005. 1st International Conference on
Conference_Location
Kuala Lumpur, Malaysia
Print_ISBN
978-1-4244-0011-9
Electronic_ISBN
978-1-4244-0012-6
Type
conf
DOI
10.1109/CCSP.2005.4977207
Filename
4977207
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