DocumentCode
1613462
Title
Catastrophic failure of power silicon PN junctions at high temperature induced by the surface leakage reverse current
Author
Obreja, V.V.N. ; Buiu, O. ; Nuttal, K.I. ; Codreanu, C. ; Sung, M.L. ; Pei, P.
Author_Institution
Nat. R&D Inst. for Microtechnology, Bucharest, Romania
fYear
2004
Firstpage
185
Lastpage
188
Abstract
The operation of commercial power silicon devices, available at this time, is not possible above 175-200°C junction temperature, without risk of failure. The surface leakage reverse current component is a source of nonnegligible localized power dissipation at high temperature. An overheating at the junction peripheral surface is possible and the reverse current thermal runaway may lead to definitive material degradation at the junction edge. Typical I-V reverse characteristics from room temperature to above 200°C, from available devices on the market, are shown. The presence of the surface current for standard recovery and fast recovery high voltage junctions is outlined.
Keywords
elemental semiconductors; leakage currents; p-n junctions; power semiconductor devices; semiconductor device reliability; silicon; 175 to 200 degC; PN junction catastrophic failure; Si; diodes; fast recovery high voltage junctions; high temperature induced failure; junction edge material degradation; junction peripheral surface overheating; junction temperature; localized power dissipation; power silicon PN junctions; power transistors; surface leakage reverse current; thermal runaway; thyristors; Consumer electronics; Failure analysis; Heat sinks; Power dissipation; Research and development; Silicon; Surface resistance; Temperature; Thermal resistance; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits, 2004. IPFA 2004. Proceedings of the 11th International Symposium on the
Print_ISBN
0-7803-8454-7
Type
conf
DOI
10.1109/IPFA.2004.1345587
Filename
1345587
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