Title :
Catastrophic failure of power silicon PN junctions at high temperature induced by the surface leakage reverse current
Author :
Obreja, V.V.N. ; Buiu, O. ; Nuttal, K.I. ; Codreanu, C. ; Sung, M.L. ; Pei, P.
Author_Institution :
Nat. R&D Inst. for Microtechnology, Bucharest, Romania
Abstract :
The operation of commercial power silicon devices, available at this time, is not possible above 175-200°C junction temperature, without risk of failure. The surface leakage reverse current component is a source of nonnegligible localized power dissipation at high temperature. An overheating at the junction peripheral surface is possible and the reverse current thermal runaway may lead to definitive material degradation at the junction edge. Typical I-V reverse characteristics from room temperature to above 200°C, from available devices on the market, are shown. The presence of the surface current for standard recovery and fast recovery high voltage junctions is outlined.
Keywords :
elemental semiconductors; leakage currents; p-n junctions; power semiconductor devices; semiconductor device reliability; silicon; 175 to 200 degC; PN junction catastrophic failure; Si; diodes; fast recovery high voltage junctions; high temperature induced failure; junction edge material degradation; junction peripheral surface overheating; junction temperature; localized power dissipation; power silicon PN junctions; power transistors; surface leakage reverse current; thermal runaway; thyristors; Consumer electronics; Failure analysis; Heat sinks; Power dissipation; Research and development; Silicon; Surface resistance; Temperature; Thermal resistance; Voltage;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2004. IPFA 2004. Proceedings of the 11th International Symposium on the
Print_ISBN :
0-7803-8454-7
DOI :
10.1109/IPFA.2004.1345587