Title :
Source of Low-Energy High-Current Gaseous Ion Flow Based on a Discharge with Electron Injection
Author :
Vizir, A.V. ; Shandrikov, M.V. ; Oks, E.M. ; Yushkov, G.Yu. ; Anders, A. ; Baldwin, D.A.
Author_Institution :
High Current Electron. Inst. Russian Acad. of Sci., Tomsk
Abstract :
Summary form only given. A novel technique of low-energy high current gaseous ion flow generation was explored and an ion source based on this technique was developed. The source utilizes a DC high-current (up to 35 A) gaseous discharge with electron injection into the cathode region. Electron generation and injection is accomplished by using an additional arc discharge with a "cold" (filament less) hollow cathode. Low contamination of plasma is achieved by low discharge voltage (avoidance of sputtering), as well as by special geometric configuration of the emitter discharge electrodes thereby filtering (removing) the erosion products stemming from the emitter cathode.
Keywords :
arcs (electric); ion sources; plasma sources; plasma transport processes; DC ion flow; arc discharge; cold hollow cathode; electric energy consumption; electron generation; electron injection; gas flow rate; gaseous discharge; ion source; ion technologies; low discharge voltage; low-energy high-current gaseous ion flow; metallic ions; plasma contamination; plasma sputtering; Arc discharges; Cathodes; Contamination; Electrodes; Electrons; Fault location; Ion sources; Low voltage; Plasma sources; Sputtering;
Conference_Titel :
Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on
Conference_Location :
Albuquerque, NM
Print_ISBN :
978-1-4244-0915-0
DOI :
10.1109/PPPS.2007.4345461
