• DocumentCode
    1614469
  • Title

    Development of Automatic Process Control system with simulation in PECVD system

  • Author

    Kim, Youn-Jin ; Lee, Hong-Chul

  • Author_Institution
    Div. of Inf. Manage. Eng., Korea Univ., Seoul
  • fYear
    2008
  • Firstpage
    1475
  • Lastpage
    1478
  • Abstract
    We develop the automatic process control system to maximize the number of available process chambers by controlling the time to start cleaning each chamber. Firstly, to achieve the purpose we build the controller model which creates and changes the pseudo RPSC counter properly by controlling other factors: unit priority, robot sequence etc. Secondly, for testing the control system we design one of the representative PECVD systems, and experiment the simulated system with the APC system and without it under various conditions. Finally, we optimize the system with the evolution strategy. As a result, not only major performance indicators; cycle time and throughput but also the variations of them have improved than before adapting the system. The contribution of this research is to present the practical solution concerned with various and complex issues in the real world.
  • Keywords
    cleaning; plasma CVD; process control; semiconductor process modelling; TFT-LCD; automatic process control system; cleaning; cycle time; evolution strategy; performance indicators; plasma enhanced chemical vapor deposition; process chambers; representative PECVD systems; robot sequence; throughput; Artificial neural networks; Atmosphere; Atmospheric modeling; Automatic control; Cleaning; Control system synthesis; Counting circuits; Process control; Robotics and automation; Service robots; Automatic Process Control(APC); PECVD; RPSC; Simulation; TFT-LCD;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Control, Automation and Systems, 2008. ICCAS 2008. International Conference on
  • Conference_Location
    Seoul
  • Print_ISBN
    978-89-950038-9-3
  • Electronic_ISBN
    978-89-93215-01-4
  • Type

    conf

  • DOI
    10.1109/ICCAS.2008.4694375
  • Filename
    4694375