DocumentCode
1614469
Title
Development of Automatic Process Control system with simulation in PECVD system
Author
Kim, Youn-Jin ; Lee, Hong-Chul
Author_Institution
Div. of Inf. Manage. Eng., Korea Univ., Seoul
fYear
2008
Firstpage
1475
Lastpage
1478
Abstract
We develop the automatic process control system to maximize the number of available process chambers by controlling the time to start cleaning each chamber. Firstly, to achieve the purpose we build the controller model which creates and changes the pseudo RPSC counter properly by controlling other factors: unit priority, robot sequence etc. Secondly, for testing the control system we design one of the representative PECVD systems, and experiment the simulated system with the APC system and without it under various conditions. Finally, we optimize the system with the evolution strategy. As a result, not only major performance indicators; cycle time and throughput but also the variations of them have improved than before adapting the system. The contribution of this research is to present the practical solution concerned with various and complex issues in the real world.
Keywords
cleaning; plasma CVD; process control; semiconductor process modelling; TFT-LCD; automatic process control system; cleaning; cycle time; evolution strategy; performance indicators; plasma enhanced chemical vapor deposition; process chambers; representative PECVD systems; robot sequence; throughput; Artificial neural networks; Atmosphere; Atmospheric modeling; Automatic control; Cleaning; Control system synthesis; Counting circuits; Process control; Robotics and automation; Service robots; Automatic Process Control(APC); PECVD; RPSC; Simulation; TFT-LCD;
fLanguage
English
Publisher
ieee
Conference_Titel
Control, Automation and Systems, 2008. ICCAS 2008. International Conference on
Conference_Location
Seoul
Print_ISBN
978-89-950038-9-3
Electronic_ISBN
978-89-93215-01-4
Type
conf
DOI
10.1109/ICCAS.2008.4694375
Filename
4694375
Link To Document