DocumentCode
1614555
Title
Ion cyclotron resonant heating in a helicon plasma source
Author
Kline, John ; Scime, Earl ; Keiter, P. ; Balkey, M.
Author_Institution
West Virginia Univ., Morgantown, WV, USA
fYear
1998
Firstpage
161
Abstract
Summary form only given. An ion cyclotron resonant heating system has been developed for heating ions and controlling the ion temperature anisotropy in a helicon plasma source. Because of the very low frequency waves used, approximately 50 kHz, particular care has been taken with impedance matching of the antenna. The antenna is driven with a 1000 W source over a frequency range of 25-125 kHz. The parallel and perpendicular ion temperatures in argon plasmas are measured with a laser induced fluorescence diagnostic tuned to a metastable argon ion transition. Measurements of the efficiency of ion heating has been accomplished for several different antenna geometries. Data for both perpendicular and parallel temperatures at the fundamental and second harmonic ion cyclotron frequencies will be presented.
Keywords
helicons; 1000 W; 25 to 125 kHz; 50 kHz; Ar; Ar plasmas; antenna; antenna geometries; frequency range; fundamental ion cyclotron frequency; helicon plasma source; impedance matching; ion cyclotron resonant heating; ion temperature anisotropy; laser induced fluorescence diagnostic; metastable Ar ion transition; parallel ion temperatures; perpendicular ion temperatures; plasma heating; second harmonic ion cyclotron frequency; very low frequency waves; Antenna measurements; Argon; Cyclotrons; Frequency; Heating; Plasma measurements; Plasma sources; Plasma temperature; Resonance; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location
Raleigh, NC, USA
ISSN
0730-9244
Print_ISBN
0-7803-4792-7
Type
conf
DOI
10.1109/PLASMA.1998.677581
Filename
677581
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