DocumentCode :
1614555
Title :
Ion cyclotron resonant heating in a helicon plasma source
Author :
Kline, John ; Scime, Earl ; Keiter, P. ; Balkey, M.
Author_Institution :
West Virginia Univ., Morgantown, WV, USA
fYear :
1998
Firstpage :
161
Abstract :
Summary form only given. An ion cyclotron resonant heating system has been developed for heating ions and controlling the ion temperature anisotropy in a helicon plasma source. Because of the very low frequency waves used, approximately 50 kHz, particular care has been taken with impedance matching of the antenna. The antenna is driven with a 1000 W source over a frequency range of 25-125 kHz. The parallel and perpendicular ion temperatures in argon plasmas are measured with a laser induced fluorescence diagnostic tuned to a metastable argon ion transition. Measurements of the efficiency of ion heating has been accomplished for several different antenna geometries. Data for both perpendicular and parallel temperatures at the fundamental and second harmonic ion cyclotron frequencies will be presented.
Keywords :
helicons; 1000 W; 25 to 125 kHz; 50 kHz; Ar; Ar plasmas; antenna; antenna geometries; frequency range; fundamental ion cyclotron frequency; helicon plasma source; impedance matching; ion cyclotron resonant heating; ion temperature anisotropy; laser induced fluorescence diagnostic; metastable Ar ion transition; parallel ion temperatures; perpendicular ion temperatures; plasma heating; second harmonic ion cyclotron frequency; very low frequency waves; Antenna measurements; Argon; Cyclotrons; Frequency; Heating; Plasma measurements; Plasma sources; Plasma temperature; Resonance; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-4792-7
Type :
conf
DOI :
10.1109/PLASMA.1998.677581
Filename :
677581
Link To Document :
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