Title :
Isolating failure location by using a dynamic emission microscopy system -a specific IddQ fail case study
Author :
Shen, Cha-Ming ; Chen, Chien-Hui
Author_Institution :
Taiwan Semicond. Manuf. Co., Hsin-Chu, Taiwan
Abstract :
The purpose of this paper is to present a novel failure analysis application of a dynamic emission microscopy system, which is implemented by photoemission microscopy coupled with a logic tester and corresponding software. The system not only filtered out spurious hot spots that would mislead analysts, but also caught valid emission spots on the failure block when very faint photoemission was caused by a small defect at the specific IddQ state. PFA (physical failure analysis) results are also revealed to show the fault isolation located by the dynamic emission microscopy, showing that the system is successful.
Keywords :
failure analysis; integrated circuit testing; logic testing; photoelectron microscopy; IddQ failures; PFA; dynamic emission microscopy system; emission spots; failure location isolation; logic tester; physical failure analysis; spurious hot spots; very faint photoemission; Computer aided software engineering; Current measurement; Failure analysis; Logic testing; Microscopy; Phase measurement; Photoelectricity; Semiconductor device manufacture; Semiconductor device measurement; System testing;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2004. IPFA 2004. Proceedings of the 11th International Symposium on the
Print_ISBN :
0-7803-8454-7
DOI :
10.1109/IPFA.2004.1345634
