Investigating Intensities of Very High Voltage Rise dv/dt Pulsed Power Source in Atmospheric Microplasma

Summary form only given. Fast rising voltage excites plasma discharges applied to light emitter and reactive treatment. Fast-rising voltage pulse, maximum rise up voltage as high as 436 MV/s, was generated by a compact pulse power generator. The micro-discharge apparatus consists of a bottom electrode made of a stainless steel sheet with 17 x 24 mm and an upper barrier coated by transparent conducting indium tin oxide film (ITO), and gap width (600 -1050 micro-m) filled with air at normal atmospheric pressure. Micro barrier discharge was excited in air. Sequences of images were recorded at micro-second to several hundred nano-seconds. The intensity distributions were calculated statistically. In this preliminary research, experiment was conducted in high voltage pulse at 2 kHz was supplied from pulse-power generator. Images taken at 100 ns, an area of 120 x 130 pixels of in tensity was determined by using Sobel edge enhancement method. Evolution of the intensity of each pixel were measured and investigated during voltage rise at varied voltage (6-7 kV).