• DocumentCode
    1615114
  • Title

    Modeling the Coupling through Substrate for Frequencies up to 100GHz

  • Author

    Gerakis, Vasileios ; Christos, Fontounasios ; Hatzopoulos, Alkis

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Aristotle Univ. of Thessaloniki, Thessaloniki, Greece
  • fYear
    2015
  • Firstpage
    165
  • Lastpage
    168
  • Abstract
    A study on the coupling through substrate using the case of two square metal pads over bulk silicon substrate with epitaxial layer is presented. A lightly doped profile is adopted and it is simulated by means of an electromagnetic simulator for various pad distances and different metal layers, assuming a 65 nm bulk CMOS technology. Suggestions how to reduce the simulation time when a large number of isolation layers is involved are also provided. Furthermore, the increase of isolation (resulting in reduction of the noise coupling) between the pads by using proper metal guard rings is also analyzed and the impact of various guard ring design (geometrical) parameters is examined. S parameters are used to compare the various structures. A substrate circuit-model is proposed and evaluated for frequencies above 30 GHz.
  • Keywords
    CMOS integrated circuits; S-parameters; coupled circuits; doping profiles; elemental semiconductors; integrated circuit modelling; semiconductor epitaxial layers; silicon; S parameters; Si; bulk CMOS technology; bulk silicon substrate; circuit model; coupling through substrate; electromagnetic simulator; epitaxial layer; isolation layers; lightly doped profile; metal guard rings; metal layers; noise coupling; size 65 nm; square metal pads; Capacitance; Conductivity; Couplings; Integrated circuit modeling; Metals; Noise; Substrates; Guard ring; Metal pad coupling; Substrate noise;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design and Diagnostics of Electronic Circuits & Systems (DDECS), 2015 IEEE 18th International Symposium on
  • Conference_Location
    Belgrade
  • Print_ISBN
    978-1-4799-6779-7
  • Type

    conf

  • DOI
    10.1109/DDECS.2015.25
  • Filename
    7195692