Title :
Advanced CMOS reliability challenges
Author_Institution :
Logic Technol. Dev. Quality & Reliability, Intel Corp., Hillsboro, OR, USA
Abstract :
This work reviews transistors of advanced CMOS process nodes from a reliability perspective and covers some of the important challenges and solutions. Physical mechanisms for various modes are investigated for 65nm to 22nm nodes with focus on disruptive changes such as HK/MG and Tri-gate/FinFET. The importance of modeling non-idealities and variation is also emphasized, and projections are made for scaling to sub-20nm with comparisons to existing research.
Keywords :
CMOS integrated circuits; MOSFET circuits; integrated circuit modelling; integrated circuit reliability; HK-MG; advanced CMOS process nodes; advanced CMOS reliability; physical mechanisms; transistors; tri-gate-FinFET; Aging; Degradation; FinFETs; Integrated circuit reliability; Logic gates; Optimization;
Conference_Titel :
VLSI Technology, Systems and Application (VLSI-TSA), Proceedings of Technical Program - 2014 International Symposium on
Conference_Location :
Hsinchu
DOI :
10.1109/VLSI-TSA.2014.6839637
