Title :
Two-dimensional imaging of NO density during NOx removal by LIF technique in a corona radical shower reactor
Author :
Kanazawa, Seiji ; Shuto, Yasuyuki ; Sato, Naruaki ; Ohkubo, Toshikazu ; Nomoto, Yukiharu ; Mizeraczyk, Jerzy ; Chang, Jen-Shih
Author_Institution :
Dept. of Electr. & Electron. Eng., Oita Univ., Japan
Abstract :
Two-dimensional NO concentration distribution was studied by using a planar laser induced fluorescence (PLIF) technique in a corona radical shower system during NOx removal. In order to monitor the ground-state NO molecules, NO transition at 226 nm was used. The corona radical shower reactor consists of a nozzle-to-plate electrode system, having an electrode gap of 50 mm. Stable DC streamer corona discharge was generated at atmospheric pressure and laser pulses in the form of the sheet were shot between the gap during the discharge. LIP signal emitted at 90 degree to the laser sheet was imaged onto a gated ICCD camera and the two-dimensional LIF images around the streamer corona region were recorded under steady-state DC corona condition in NOx removal. The obtained results showed that the density of NO molecule decreased not only in the plasma region formed by the corona streamers but also in both the upstream and downstream regions of the reactor. This information is important for optimizing the corona radical shower reactors.
Keywords :
CCD image sensors; air pollution control; corona; electrodes; fluorescence; laser beam effects; nitrogen compounds; nozzles; 226 nm; 50 mm; DC streamer corona discharge; LIF technique; NO; NO transition; NO/sub x/ removal; corona radical shower reactors; corona radical shower system; gated ICCD camera; laser induced fluorescence; nozzle-to-plate electrode system; two-dimensional NO density imaging; Corona; DC generators; Electrodes; Fluorescence; Inductors; Laser stability; Laser transitions; Monitoring; Optical pulse generation; Streaming media;
Conference_Titel :
Industry Applications Conference, 2001. Thirty-Sixth IAS Annual Meeting. Conference Record of the 2001 IEEE
Conference_Location :
Chicago, IL, USA
Print_ISBN :
0-7803-7114-3
DOI :
10.1109/IAS.2001.955607