Proposal of Distributed Architecture for Micromirror Image Generation in Maskless Optolithography System

Recent maskless lithography technologies using MEMS devices provide the attractive advantage of low cost manufacturing such as one for semiconductors. However, in order to utilize maskless lithography technology into large flat panel display manufacturing, the difficulties that arise in the generation and transmission of huge micromirror image data should be overcome. We aim to develop a strategy for real time data generation and transmission by distributing the huge image data being individually processed on multiple computers. Entire image data generation processes relevant to maskless lithography are analyzed upon the unit micromirror. As a result, the distributed architecture capable of image data generation and transmission is devised. Communications and controls between the distributed systems are performed upon the client-sever model. For the verification of the proposed architecture, lithography experiments fabricating actual patterns on wafers are carried out with a set of two image data individually generated on two different computers upon the distributed architecture. The boundary created by two interfacing micromirrors is matched exactly. The accuracy of the system upon the proposed architecture is ensured through the actual FPD fabrication