A new tool for investigating the electrical structure of carbon black filled polymers

Author

Ravier, Jérôme ; Carmona, François ; Houzé, Frédéric ; Nilsson, Ulf ; Campus, Alfred

Author_Institution

Centre de Recherches Paul Pascal, Pessac, France

fYear

2001

fDate

6/23/1905 12:00:00 AM

Firstpage

361

Lastpage

364

Abstract

We have reported the first use of the Resiscope associated to an atomic force microscope (AFM) for investigating composite materials comprising an insulating matrix and conducting particles. For the first time we have been able to visualise the "conducting paths" through the materials which have long been supposed to exist in such heterogeneous materials. A systematic characterisation of their three dimensional electrical mesostructure including the sample thickness as an independent variable is now possible with this new instrument

Keywords

atomic force microscopy; carbon; filled polymers; C; Resiscope; atomic force microscope; carbon black filled polymer; composite material; conducting particles; heterogeneous material; insulating matrix; three-dimensional electrical mesostructure; Atomic force microscopy; Conducting materials; Electric resistance; Electrical resistance measurement; Polymers; Rough surfaces; Semiconductor materials; Surface resistance; Surface roughness; Surface topography;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid Dielectrics, 2001. ICSD '01. Proceedings of the 2001 IEEE 7th International Conference on

Conference_Location

Eindhoven

Print_ISBN

0-7803-6352-3

Type

conf

DOI

10.1109/ICSD.2001.955656

Filename

955656