DocumentCode
1617607
Title
A methodology for evaluating the area of contacts to improve the accuracy of contact resistance measurements
Author
Walton, A.J. ; Fallon, M. ; Stevenson, J.T. ; Ross, A. ; Holwill, R.J.
Author_Institution
Dept. of Electr. Eng., Edinburgh Univ., UK
fYear
1990
Firstpage
23
Lastpage
28
Abstract
The contact area is an important parameter in the measurement of specific sheet resistivity. The authors propose models which can be used to represent the area of contact together with the measurements that are required for the calculation of contact area. Particular attention is given to optical measurements, SEM (scanning electron microscope), and Vernier-type measurements
Keywords
contact resistance; electric resistance measurement; measurement by laser beam; scanning electron microscopy; SEM; Vernier-type measurements; contact area; contact resistance measurements; optical measurements; specific sheet resistivity; Area measurement; Computational geometry; Conductivity; Contact resistance; Electric variables measurement; Electrical resistance measurement; Integrated circuit measurements; Kelvin; Semiconductor device modeling; Shape;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 1991. ICMTS 1991. Proceedings of the 1991 International Conference on
Conference_Location
Kyoto
Print_ISBN
0-87942-588-1
Type
conf
DOI
10.1109/ICMTS.1990.161707
Filename
161707
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