DocumentCode
1620068
Title
Evaluating electrostatic damage prevention methods for full-scale reticle manufacturing
Author
Turley, Christina ; Kindt, Louis ; Kinnear, John
Author_Institution
IBM Corp., Essex Junction, VT, USA
fYear
2013
Firstpage
1
Lastpage
7
Abstract
Discovery of Electric Field Induced Migration (EFM) below the control limits of Electrostatic Discharge (ESD) prevention has raised concerns in photomask manufacturing. We evaluated the control system by focusing on handling and processing. Using an in-situ monitoring device in combination with an ESD test reticle, we evaluated what infrastructure was necessary to accommodate new electrostatic concerns.
Keywords
electrostatic discharge; reticles; ESD; electric field induced migration; electrostatic damage prevention method; electrostatic discharge prevention; full scale reticle manufacturing; in-situ monitoring device; photomask manufacturing; Electric fields; Electrostatic discharges; Electrostatics; Manufacturing; Monitoring; Resistance; Standards; EFM; ESD; Reticle damage; electrostatic damage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD), 2013 35th
Conference_Location
Las Vegas, NV
ISSN
0739-5159
Type
conf
Filename
6635944
Link To Document