Micromirror based Lithography Simulation System based on Overlay Intensity Basis

To generate proper patterns for micromirror based lithography, millions of micromirrors need to be addressed and adjusted, individually and instantaneously. In this study, a strategy for micromirror based lithography simulation is proposed. Accounting for the instantaneous distribution of the light energy from a rotated micromirror onto a translating substrate, the overlay intensity basis is defined as the three-dimensional pattern image upon the accumulation of irradiated energy by a unit micromirror per unit translating phase. A prototype lithography simulation system for generating lithographic data and predicting the lithography results is implemented upon the overlay intensity basis. To ensure the system works, parallel with the simulation, actual lithography is performed on prototype equipment to fabricate actual wafers. The overall results of the simulations and experiments show consistency, both physically and mathematically. The properness of the proposed strategy for micromirror based lithography simulation and the precision of the implemented lithography simulation system are ensured