• DocumentCode
    1620919
  • Title

    Simple technique for improving the hot-carrier reliability of single-poly bipolar transistors

  • Author

    Kosier, S.L. ; DeLaus, M. ; Wei, A. ; Schrimpf, R.D. ; Martinez, A.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Arizona Univ., Tucson, AZ, USA
  • fYear
    1994
  • Firstpage
    205
  • Lastpage
    208
  • Abstract
    It is shown experimentally and through simulation that reduced screen oxide thickness leads to increased breakdown voltage of the emitter-base junction (BVebo) and reduced peak electric field at breakdown, which translates into improved hot-carrier reliability. The effect of reduced screen oxide thickness on the peak cutoff frequency is minimal. For these devices, thinning the screen oxide from 55 to 35 nm increases BVebo by 0.2 V, improves the hot-carrier-induced excess base current by more than an order of magnitude at a base-emitter voltage of 0.6 V, and degrades the peak cutoff frequency by only 3 percent
  • Keywords
    hot carriers; 0.6 V; 35 nm; Si; base-emitter voltage; breakdown voltage; emitter-base junction; excess base current; hot-carrier reliability; peak cutoff frequency; peak electric field; screen oxide thickness; single-poly bipolar transistors; BiCMOS integrated circuits; Bipolar transistors; Breakdown voltage; Cutoff frequency; Degradation; Electric breakdown; Hot carriers; Impurities; Lead compounds; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting,1994., Proceedings of the 1994
  • Conference_Location
    Minneapolis, MN
  • Print_ISBN
    0-7803-1316-X
  • Type

    conf

  • DOI
    10.1109/BIPOL.1994.587895
  • Filename
    587895