• DocumentCode
    1620964
  • Title

    0.5 μm silicon bipolar transistor technology for analog applications

  • Author

    Nakajima, H. ; Itoh, N. ; Inou, K. ; Iinuma, T. ; Matsuda, S. ; Yoshino, C. ; Katsumata, Y. ; Iwai, Hisato

  • Author_Institution
    Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
  • fYear
    1994
  • Firstpage
    213
  • Lastpage
    216
  • Abstract
    A silicon bipolar technology for low power analog applications with a 0.5 μm design rule has been developed. A maximum fT value of 24 GHz (@ VCE=2 V, IC=260 μA) is obtained, as well as a 1/32 prescaler free-run frequency of 8.0 GHz (@ VCC=5 V, IC=600 μA)
  • Keywords
    silicon; 0.5 micron; 2 V; 24 GHz; 260 muA; 5 V; 600 muA; 8 GHz; Si; Si bipolar transistor technology; analog applications; low power applications; submicron design rule; BiCMOS integrated circuits; Bipolar transistor circuits; Bipolar transistors; Boron; Electric variables; Electrodes; Impurities; Ion implantation; Meeting planning; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Bipolar/BiCMOS Circuits and Technology Meeting,1994., Proceedings of the 1994
  • Conference_Location
    Minneapolis, MN
  • Print_ISBN
    0-7803-1316-X
  • Type

    conf

  • DOI
    10.1109/BIPOL.1994.587897
  • Filename
    587897