DocumentCode :
1622057
Title :
A modified sliding wire potentiometer test structure for mapping nanometer-level distances
Author :
Cresswell, M.W. ; Gaitan, M. ; Allen, R.A. ; Linholm, L.W.
Author_Institution :
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
fYear :
1990
Firstpage :
129
Lastpage :
134
Abstract :
Present a modified voltage-dividing potentiometer test structure which overcomes a problem typical in scaling electrical test structures: it provides a correction for electrical length shortening of a resistor strip caused by the attachment of voltage taps of nonnegligible width. The test structure was implemented in chrome on quartz, and measurements of displacements between 10 and 500 nm with ±12-nm random error were made using available test equipment. The enhanced precision of the measurement derives from reducing the size of the structure from previous design methods. The enhanced accuracy of the displacement measurement derives from scaling the length of the potentiometer bridge while simultaneously providing for nonscaled widths of the voltage taps. Measurements using these corrections demonstrate an improvement of up to 20% in measurement accuracy, and further improvements can be expected with optimized designs
Keywords :
VLSI; displacement measurement; integrated circuit testing; potentiometers; 10 to 500 nm; displacement measurement; electrical length shortening; nanometer-level distances; nonscaled widths; resistor strip; scaling; sliding wire potentiometer test structure; voltage taps; Design methodology; Displacement measurement; Potentiometers; Resistors; Size measurement; Strips; Test equipment; Testing; Voltage; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1991. ICMTS 1991. Proceedings of the 1991 International Conference on
Conference_Location :
Kyoto
Print_ISBN :
0-87942-588-1
Type :
conf
DOI :
10.1109/ICMTS.1990.161726
Filename :
161726
Link To Document :
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