Title :
Self-aligned inkjet printing of TFTs/circuits
Author :
Roy, Sandip ; Shunpu Li
Author_Institution :
Microsyst. Center, Univ. Coll. Cork, Cork, Ireland
Abstract :
We have demonstrated a novel process to fabricate solution-processable TFTs with a one-step, self-aligned definition of the dimensions in all functional layers. The TFT-channel, semiconductor materials, and gate dimension of different layers are all determined by one-step imprint process and the subsequent pattern transfer without the need for multiple patterning and mask alignment. In addition, all the techniques used here, i.e., imprinting, wet/dry etching, and inkjet printing, are available in roll-to-roll processes. The demonstrated high-resolution features, mask alignment free process, and compatibility to roll-to-roll fabrication show that this technique is ready to use and has the advantage of low cost.
Keywords :
etching; ink jet printing; semiconductor materials; thin film transistors; TFT-channel; gate dimension; mask alignment free process; roll-to-roll processes; self-aligned inkjet printing; semiconductor materials; thin film transistors; wet-dry etching; Electrodes; Fabrication; Logic gates; Polymers; Printing; Resists; Thin film transistors; imprinting; inkjet printing; polymer transistor; self-alignment;
Conference_Titel :
Emerging Electronics (ICEE), 2012 International Conference on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4673-3135-7
DOI :
10.1109/ICEmElec.2012.6636224