Title :
Temperature and stress dependent properties of barrier type anodic Al2O3 MIM capacitor
Author :
Kannadassan, D. ; Karthik, R. ; Mallick, P.S. ; Baghini, Maryam Shojaei
Author_Institution :
Sch. of Electr. Eng., VIT Univ., Vellore, India
Abstract :
This paper presents a high-k barrier type anodic Al2O3 Metal-Insulator-Metal (MIM) capacitor for mixed signal/RF applications. The anodic oxide MIM capacitor shows high capacitance density of 6.01fF/μm2 and low voltage coefficient of capacitance less than 500ppm/V. Due to reduced defect density and improved polarization, the capacitor exhibits variability of less than 6% in the frequency range of 1KHz to 1MHz at 3V. The fabricated capacitor also shows a high breakdown field of 8.7MV/cm. The measured leakage current density is 1nA/cm2 at 5V at room temperature which is the lowest reported value till date. The capacitor also exhibits improved reliability as TBD of 10 years for applied voltage of 2V at room temperature. The capacitor meets the requirements of ITRS 2012 predicted for wireless and mixed signal/RF technologies.
Keywords :
MIM devices; alumina; anodisation; capacitance; capacitors; electric breakdown; Al2O3; ITRS 2012; barrier type Anodic Al2O3 MIM capacitor; breakdown field; capacitance density; defect density; frequency 1 kHz to 1 MHz; leakage current density; metal-insulator-metal capacitor; mixed signalJRF applications; polarization; reliability; stress dependent properties; temperature 293 K to 298 K; temperature dependent properties; voltage 2 V to 5 V; voltage coefficient of capacitance; Capacitance; Capacitors; Educational institutions; Electric breakdown; Insulators; Reliability; Temperature measurement; Anodization; Constant Voltage Stress; High-k; MIM capacitor; Time-to-Breakdown;
Conference_Titel :
Emerging Electronics (ICEE), 2012 International Conference on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4673-3135-7
DOI :
10.1109/ICEmElec.2012.6636238