Low cost RF MEMS switches using photodefinable mixed oxide dielectrics

This paper presents the design, fabrication and testing of capacitive RF MEMS switches with a new, low processing cost dielectric layer on high-resistivity silicon substrate. The dielectric can be spun on the wafer and its parameters (dielectric constant and loss) can be controlled during fabrication to achieve the desired values. Both bridge- and cantilever-type switches were fabricated on high-/spl rho/ silicon substrate using a simple low cost four-mask process. Measured results are presented.