Title :
Evidence for, non-ECR, collisionless heating in a low pressure microwave discharge
Author :
Perrin, M. ; Grotjohn, T. ; Asmussen, J.
Author_Institution :
Michigan State Univ., East Lansing, MI, USA
Abstract :
Summary form only given. It has been shown that at low pressures (<5 mTorr) collisionless heating mechanisms (not ohmic heating) are responsible for the coupling of EM energy into both parallel plate and high density inductive discharges. A question remains: are there collisionless heating mechanisms present in low pressure microwave discharges? This paper will present the status and results of a set of experiments that investigate microwave discharge heating processes at low pressure. In this investigation an argon plasma is excited by a cylindrical cavity applicator with inner diameter of 17.78 cm. Power is coupled into the cavity with a variable length (0-6 cm) probe antenna placed in the center of a variable height (5-15 cm) top plate. The power input is 100-400 W at a microwave frequency of 2.45 GHz. The discharge pressure is varied from 0.5-40 mTorr and the argon flow rates range from 2-50 sccm. The discharge chamber is 12.5 cm in diameter and 8 cm tall. No permanent or electro-magnets are used in this experiment.
Keywords :
Langmuir probes; high-frequency discharges; plasma density; plasma heating; plasma pressure; plasma probes; 0.5 to 40 mtorr; 100 to 400 W; 2.45 GHz; Ar; Ar plasma; E-field probes; EM energy; H-field probes; Langmuir probes; cold plasma model; cylindrical cavity applicator; discharge pressure; electro-magnets; electron collision frequency; global plasma models; high density inductive discharges; low pressure microwave discharge; nonECR collisionless heating; noncollisional power absorption fraction; ohmic heating; parallel plate inductive discharges; permanent magnets; power input; probe antenna; Cathodes; Electromagnetic heating; Electron beams; Electron emission; Electron sources; Fault location; Nuclear and plasma sciences; Plasma applications; Plasma density; Plasma sources;
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
Print_ISBN :
0-7803-4792-7
DOI :
10.1109/PLASMA.1998.677648