A miniaturized inductively coupled plasma source for applications in microelectromechanical systems

Summary form only given. A miniaturized inductively coupled plasma (mICP) source has been fabricated to examine the feasibility of scaling ICPs to sizes comparable with microelectromechanical systems (MEMS). The mICP adds a new dimension to MEMS capabilities in the same way that large-scale plasmas enrich engineering, manufacturing, and diagnostic fields. Planar-coil inductively coupled plasmas are ideal for MEMS applications since the flat geometry is easily fabricated using integrated circuit techniques. In addition, planar ICPs create intense discharges without electrodes, which may be easily eroded and contaminated.