Title :
A miniaturized inductively coupled plasma source for applications in microelectromechanical systems
Author :
Yin, Y. ; Hopwood, J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
Abstract :
Summary form only given. A miniaturized inductively coupled plasma (mICP) source has been fabricated to examine the feasibility of scaling ICPs to sizes comparable with microelectromechanical systems (MEMS). The mICP adds a new dimension to MEMS capabilities in the same way that large-scale plasmas enrich engineering, manufacturing, and diagnostic fields. Planar-coil inductively coupled plasmas are ideal for MEMS applications since the flat geometry is easily fabricated using integrated circuit techniques. In addition, planar ICPs create intense discharges without electrodes, which may be easily eroded and contaminated.
Keywords :
discharges (electric); micromechanical devices; plasma production; MEMS applications; fabrication; flat geometry; integrated circuit techniques; intense discharges; large-scale plasmas; microelectromechanical systems; miniaturized inductively coupled plasma source; planar-coil inductively coupled plasmas; Coupling circuits; Geometry; Large-scale systems; Manufacturing; Microelectromechanical systems; Micromechanical devices; Plasma applications; Plasma diagnostics; Plasma materials processing; Plasma sources;
Conference_Titel :
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location :
Raleigh, NC, USA
Print_ISBN :
0-7803-4792-7
DOI :
10.1109/PLASMA.1998.677649
