DocumentCode :
1625973
Title :
Analysis of the “hot” electron regime of operation in heterostructure field effect transistors
Author :
Martinez, E. ; Shur, M. ; Schuermeyer, F.
Author_Institution :
Wright Lab., Wright-Patterson AFB, OH, USA
fYear :
1995
Firstpage :
167
Lastpage :
170
Abstract :
An analytical model to describe the hot electron regime of operation has been presented. This model was built on a Charge Control Model and a CHINT-like model in which the electron temperature is limited by the intervalley transfer and real-space transfer of electrons. Good agreement between the models and the experimental data was found over a wide temperature range, from 198 K to 398 K. Understanding of these complex mechanisms is important to effectively reduce the gate leakage current in complementary HFETs
Keywords :
field effect transistors; hot carriers; leakage currents; semiconductor device models; 198 to 450 K; AlGaAs-InGaAs-GaAs; AlInAs-InGaAs-InP; CHINT-like model; analytical model; charge control model; complementary HFETs; electron temperature; electron transfer; gate leakage current; heterostructure field effect transistors; hot electron regime; intervalley transfer; real-space transfer; Acceleration; Analytical models; Circuits; Electrons; FETs; HEMTs; MODFETs; Solid modeling; Temperature distribution; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Signals, Systems, and Electronics, 1995. ISSSE '95, Proceedings., 1995 URSI International Symposium on
Conference_Location :
San Francisco
Print_ISBN :
0-7803-2516-8
Type :
conf
DOI :
10.1109/ISSSE.1995.497959
Filename :
497959
Link To Document :
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