Title :
3D silicon micromachined RF resonators
Author :
Strohm, K.M. ; Schmuckle, F.J. ; Yaglioglu, O. ; Luy, J.-F. ; Heinrich, W.
Author_Institution :
DairnlerChrysler Res. Center, Ulm, Germany
Abstract :
Passive components with high quality factor are required for many applications, e.g., filters. In the field of micromachining, this is commonly achieved by using multiple-wafer structures. An alternative technique is presented here together with design and measurement data, which is based on MEMS technology and yields single-wafer resonators thus reducing costs. Cavity resonators with the Si being partly removed show quality factors Q beyond 360.
Keywords :
Q-factor; cavity resonators; micromachining; micromechanical resonators; MEMS technology; Si; cavity resonators; costs; micromachined RF resonators; multiple-wafer structures; quality factor; single-wafer resonators; Anisotropic magnetoresistance; Cavity resonators; Coplanar waveguides; Dielectric losses; Fabrication; Gold; Plasma applications; Resists; Silicon; Sputter etching;
Conference_Titel :
Microwave Symposium Digest, 2003 IEEE MTT-S International
Conference_Location :
Philadelphia, PA, USA
Print_ISBN :
0-7803-7695-1
DOI :
10.1109/MWSYM.2003.1210490
