DocumentCode
1627152
Title
Tunnel field-effect transistors - status and prospects
Author
Seabaugh, A.
Author_Institution
Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
fYear
2010
Firstpage
11
Lastpage
14
Abstract
This paper reviews recent progress in the development of tunnel field-effect transistors (TFETs) toward achieving channel currents comparable to high performance MOSFETs at supply voltages less than 0.5 V and subthreshold swing less than 60 mV/decade, for logic applications. To enable high performance in TFETs, development of narrow bandgap III-V and graphene nanoribbon (GNR) channels is indicated. Beyond the switch, the tunnel junction could provide enhanced functionality and new ways to integrate logic and memory.
Keywords
MOSFET; field effect transistors; tunnel transistors; graphene nanoribbon channel; high performance MOSFET; high performance in TFET; logic application; memory; narrow bandgap; subthreshold swing; supply voltage; tunnel field-effect transistors; tunnel junction; CMOS integrated circuits; CMOS technology; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2010
Conference_Location
South Bend, IN
ISSN
1548-3770
Print_ISBN
978-1-4244-6562-0
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2010.5551883
Filename
5551883
Link To Document