• DocumentCode
    1627152
  • Title

    Tunnel field-effect transistors - status and prospects

  • Author

    Seabaugh, A.

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
  • fYear
    2010
  • Firstpage
    11
  • Lastpage
    14
  • Abstract
    This paper reviews recent progress in the development of tunnel field-effect transistors (TFETs) toward achieving channel currents comparable to high performance MOSFETs at supply voltages less than 0.5 V and subthreshold swing less than 60 mV/decade, for logic applications. To enable high performance in TFETs, development of narrow bandgap III-V and graphene nanoribbon (GNR) channels is indicated. Beyond the switch, the tunnel junction could provide enhanced functionality and new ways to integrate logic and memory.
  • Keywords
    MOSFET; field effect transistors; tunnel transistors; graphene nanoribbon channel; high performance MOSFET; high performance in TFET; logic application; memory; narrow bandgap; subthreshold swing; supply voltage; tunnel field-effect transistors; tunnel junction; CMOS integrated circuits; CMOS technology; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2010
  • Conference_Location
    South Bend, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4244-6562-0
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2010.5551883
  • Filename
    5551883