• DocumentCode
    1627615
  • Title

    Nano-Electro-Mechanical vibrating body FET resonator for high frequency integrated oscillators

  • Author

    Grogg, Daniel ; Lovera, Andrea ; Ionescu, Adrian Mihai

  • Author_Institution
    Nanoelectronic Devices Lab. (NanoLab), Ecole Polytech. Fed. de Lausanne, Lausanne, Switzerland
  • fYear
    2010
  • Firstpage
    183
  • Lastpage
    184
  • Abstract
    This paper reports on the vibrating-body field effect transistor (VB-FET) readout strategy for high frequency (>100MHz) NEM resonators, enabling direct transmission measurements and demonstrating true potential for integrated circuit co-fabrication and co-design. A VB-FET has been fabricated based on electron beam lithography in a topology that bears full resemblance with a suspended Fin-FET, with two lateral independent gates. Fig. 1 shows a topview SEM image of the investigated structure. Enhancement-mode fully-depleted transistors are integrated in the center of clamped-clamped beams with channel lengths varying from 1 to 1.5 μm. The channel width is 200 nm, dictated by the suspended silicon layer thickness. The air gap separating the gate from the channel is 105 nm and forms the lateral gate insulator, together with 27 nm thick gate thermal oxides of the movable channel and the gate sides. A perspective 3D view including, for simplicity, only one of the side gates of the VB-FET is depicted in Fig. 2.
  • Keywords
    MOSFET; electron beam lithography; nanoelectromechanical devices; resonators; scanning electron microscopy; SEM image; air gap; clamped-clamped beams; direct transmission measurements; electron beam lithography; enhancement-mode fully-depleted transistors; gate thermal oxides; high frequency NEM resonators; integrated circuit codesign; integrated circuit cofabrication; lateral independent gates; nanoelectromechanical vibrating body FET resonator; size 1 mum to 1.5 mum; size 105 nm; size 200 nm; size 27 nm; suspended FinFET; suspended silicon layer thickness; vibrating-body field effect transistor readout strategy; Electrostatics; FETs; Frequency measurement; International Electron Devices Meeting; Logic gates; Resonant frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2010
  • Conference_Location
    South Bend, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4244-6562-0
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2010.5551898
  • Filename
    5551898