• DocumentCode
    1628260
  • Title

    Optimized layout on ESD protection diode with low parasitic capacitance

  • Author

    Yeh, Chih-Ting ; Ker, Ming-Dou

  • Author_Institution
    Circuit Design Dept., Ind. Technol. Res. Inst., Hsinchu, Taiwan
  • fYear
    2010
  • Firstpage
    1701
  • Lastpage
    1703
  • Abstract
    The diode operated in forward-biased condition has been widely used as an effective on-chip electrostatic discharge (ESD) protection device at GHz RF and high-speed I/O pads in CMOS integrated circuits (ICs) due to the small parasitic loading effect and high ESD robustness. Based on waffle layout style, two modified layout styles have been proposed, which are called as multi-waffle and multi-waffle-hollow layout styles. Experimental results in a 90-nm CMOS process have confirmed that the figures of merit (FOMs) of ESD protection diodes with new proposed layout styles can be successfully improved.
  • Keywords
    CMOS integrated circuits; electrostatic discharge; CMOS integrated circuits; ESD protection device; ESD protection diode; FOM; figures of merit; forward-biased condition; low parasitic capacitance; multiwaffle-hollow layout styles; onchip electrostatic discharge; size 90 nm; Capacitance; Current measurement; Electrostatic discharge; Iterative closest point algorithm; Junctions; Layout; Transmission line measurements;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667306
  • Filename
    5667306