Title :
Lithography simulation for the fabrication of silicon photonic devices with deep-ultraviolet lithography
Author :
Wang, Xu ; Shi, Wei ; Hochberg, Michael ; Adam, Kostas ; Schelew, Ellen ; Young, Jeff F. ; Jaeger, Nicolas A F ; Chrostowski, Lukas
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC, Canada
Abstract :
We demonstrate the lithography simulation for the fabrication of silicon photonic devices using deep-ultraviolet lithography. Once the distortions arising from the fabrication process are accounted for, the comparison between predicted and measured results is excellent.
Keywords :
Bragg gratings; integrated optics; optical distortion; optical fabrication; silicon-on-insulator; ultraviolet lithography; Si; deep-ultraviolet lithography; lithography simulation; optical distortions; silicon photonic devices; Bandwidth; Bragg gratings; Fabrication; Lithography; Optical waveguides; Photonics; Silicon;
Conference_Titel :
Group IV Photonics (GFP), 2012 IEEE 9th International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4577-0826-8
DOI :
10.1109/GROUP4.2012.6324162
