DocumentCode
1628978
Title
Plasma deposited µc-Si:H wire waveguide
Author
Takei, Ryohei ; Manako, Shoko ; Omoda, Emiko ; Suzuki, Masao ; Sakakibara, Youichi ; Mori, Masahiko ; Kamei, Toshihiro
Author_Institution
Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
fYear
2012
Firstpage
349
Lastpage
351
Abstract
A plasma deposited μc-Si:H film containing 10 nm sized crystallites was used to fabricate a wire waveguide. Despite present higher propagation losses: 6.5 dB/cm (TE) and 4.7 dB/cm (TM), it should exhibit an improved photostability.
Keywords
crystallites; elemental semiconductors; hydrogen; light propagation; optical fabrication; optical losses; optical waveguides; plasma CVD; semiconductor thin films; silicon; Si:H; crystallites; photostability; plasma deposited film; plasma deposited wire waveguide; propagation losses; size 10 nm; Films; Optical device fabrication; Optical losses; Optical waveguides; Propagation losses; Silicon; Wires; µc-Si:H; Si photonics; photo-induced degradation; wire waveguide;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2012 IEEE 9th International Conference on
Conference_Location
San Diego, CA
ISSN
1949-2081
Print_ISBN
978-1-4577-0826-8
Type
conf
DOI
10.1109/GROUP4.2012.6324183
Filename
6324183
Link To Document